Wafer‐Scale Fabrication of Hierarchically Porous Silicon and Silica by Active Nanoparticle‐Assisted Chemical Etching and Pseudomorphic Thermal Oxidation

Wafer‐Scale Fabrication of Hierarchically Porous Silicon and Silica by Active Nanoparticle‐Assisted Chemical Etching and Pseudomorphic Thermal Oxidation

Stella Gries, Manuel Brinker, Berit Zeller‐Plumhoff, Dagmar Rings, Tobias Krekeler, Elena Longo, Imke Greving, and Patrick Huber

Synchrotron-based X-ray nanotomography and electron microscopy reveal that metal-assisted chemical etching combined with photolithography allows one to fabricate single-crystalline silicon with hierarchical, open porosity that can be transformed structure-conserving by oxidation to silica glass. Due to their multiscale tailorable vascularization the resulting wafer-scale monoliths promise liquid-infused hybrid materials, e.g., for energy storage and harvesting, on-chip sensorics, actuorics and (bio-)optofluidics.

Small, February, 2206842
Corresponding Author: Patrick Huber
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